计算物理 ›› 2013, Vol. 30 ›› Issue (3): 441-446.

• 论文 • 上一篇    下一篇

Ge/Pb/Si(111)生长中Ge原子沿团簇边缘扩散的三维Monte-Carlo模拟

吴黎黎, 吴锋民   

  1. 浙江师范大学凝聚态物理研究所, 浙江 金华 321004
  • 收稿日期:2012-08-27 修回日期:2012-12-06 出版日期:2013-05-25 发布日期:2013-05-25
  • 作者简介:吴黎黎(1978-),女,硕士,副教授,主要从事薄膜生长的计算机模拟,E-mail:goiuy@zjnu.cn
  • 基金资助:
    浙江省自然科学基金(Y6100384)资助项目

3D Simulation of Ge Edge-Diffusion Around Clusters in Ge/Pb/Si(111) Growth

WU Lili, WU Fengmin   

  1. Institute of Condensed matter Physics, Zhejiang Normal University, Jinhua 321004, China
  • Received:2012-08-27 Revised:2012-12-06 Online:2013-05-25 Published:2013-05-25

摘要: 用动态Monte-Carlo方法对Ge在单层表面活性剂Pb覆盖的Si(111)表面上沿团簇边缘扩散进行三维模拟.重点讨论Ge原子是否沿团簇边缘扩散,沿边缘扩散时的最大扩散步数及最近邻原子数对三维生长的影响,并计算薄膜表面粗糙度研究三维生长模式.模拟表明Ge沿团簇边缘扩散的行为对薄膜生长模式的影响很大,同时讨论了ES势对三维生长模式的影响.

关键词: 沿团簇边缘扩散, 表面活性剂, 表面粗糙度, Monte-Carlo模拟

Abstract: A kinetic Monte Carlo simulation is shown to investigate 3-dimensional growth of Ge on Si(111) substrate as monolayer of Pb atoms are pre-deposited as surfactant.We focus on Ge diffusion around edge of clusters.Effects of Ge diffusing around cluster edge,maximum diffusion steps for edge-diffusion and number of nearest neighbors on 3D growth mode are discussed.Coverage dependences of surface roughness are calculated to investigate growth mode.It shows that Ge edge-diffusion around clusters plays an important role on growth mode of 3D film growth.Effects of ES barrier on growth mode on Ge/Pb/Si(111) are explored.

Key words: edge-diffusion around clusters, surfactant, surface roughness, Monte-Carlo simulation

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