计算物理 ›› 1986, Vol. 3 ›› Issue (3): 375-382.

• 论文 • 上一篇    

用计算物理方法处理离子注入问题之一——非晶靶中的射程及能量分布计算

徐淮琪, 魏茂新   

  1. 山东工业大学
  • 收稿日期:1985-11-10 出版日期:1986-09-25 发布日期:1986-09-25

DEALING WITH THE PROBLEMS OF ION IMPLANTATION BY COMPUTATION PHYSICS METHOD(PART 1)——THE CALCULATION ON RANGE AND ENERGY DEPOSIT IN AMORPHOUS TARGETS

Xu Huai-qi, Wei Mao-xin   

  1. Shandong Polytechnic University
  • Received:1985-11-10 Online:1986-09-25 Published:1986-09-25

摘要: 本文采用计算物理方法来处理离子注入问题。计算机模拟方式采用MonteCarlo方法。本文将各种复杂组成和各种复杂结构的靶材料归结为三种基本概率函数,再用直接抽样法把给定的任意复杂形式的靶结构转换为简单、均匀、单元素的靶结构,从而可对任意形式的靶结构的离子注入问题进行计算。本文还给出了确定最大碰撞参量的经验公式。

Abstract: A computation physics method is used here to deal with the problems of ion implantation.The Monte Carlo method is adopted as the simulated method.All complicated structure and component targets can be classified to three type of probability function formulations,Then, by direct Sampling method, ion implantation problems in those targets can be fransformed to the same problems in the simple average and single element targets,So, any type of complicated ion implantation problems can be calculated easely.A experienced formulation about how to determine the maximum impact parameter is also given here in this article.