Abstract: Building on direct numerical calculation, it analyzes the dynamics of atoms propagating through a laser standing wave (SW) potential in the regime of immersion-lens.The spot size of Cr atomic deposition is estimated. It is also shown that some physical quantities, such as atomic velocity distribution, laser detuning and laser beam radius, play important roles in determining the quality of atom lithography.

Key words: atom-lithography, standing wave, quantum-mechanical numerical simulation