Abstract: Based on interconnection transmission differential equation,transform voltage and current expressions are derived by incorporating appropriate boundary conditions for interconnect energy analysis.We considered a practical transmission line with driver and load to find out relation between transform input and output voltage and current responses.Interconnection energy distribution is obtained,which considers non-ideal step stimulation.In 65 nm CMOS process,the non-uniform interconnect analytic model enables to estimate energy within 5% compared with Hspice simulations.The method has high accuracy.The analytic model can be applied to front end optimizing design and analysis of high performance global interconnection.

Key words: VLSI, distributed interconnection, non-uniform interconnect, exponential step stimulation, energy distribution