CHINESE JOURNAL OF COMPUTATIONAL PHYSICS ›› 1997, Vol. 14 ›› Issue (S1): 499-501.
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Tan Zhenyu1, He Yancai2
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Abstract: A Monte-Carlo method on low-energy electron (LEE) scatttering in multilyer and polybasic medium is proposed. The Mott cross-section applies for discribing the elastic scattering of LEE, and the idea of mean cross section is suggested to simulate LEE elastic scattering in polybasic medium; the modified Bethe formula in polybasic medium is used for calculating energy loss of LEE inelastic scattering. The energy dissipation distributions of LEE in PMMA have been obtained.
Key words: low energy electron scattering, Monte-Carlo method, electron beam lithography, energy dissipation
CLC Number:
TN01
O242.1
Tan Zhenyu, He Yancai. MONTE CARLO METHOD AND ENERGY DISSIPATION DISTRIBUTION IN LOW-ENERGY ELECTRON BEAM LITHOGRAPHY[J]. CHINESE JOURNAL OF COMPUTATIONAL PHYSICS, 1997, 14(S1): 499-501.
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