CHINESE JOURNAL OF COMPUTATIONAL PHYSICS ›› 1997, Vol. 14 ›› Issue (S1): 499-501.

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MONTE CARLO METHOD AND ENERGY DISSIPATION DISTRIBUTION IN LOW-ENERGY ELECTRON BEAM LITHOGRAPHY

Tan Zhenyu1, He Yancai2   

  1. 1. College of Electric Power, Shandong University of Technology, Jinan 250061;
    2. Shanghai Insititute of Ceramics, Chinese Academy of Sciences, 200050
  • Received:1997-02-18 Revised:1997-05-04 Online:1997-12-25 Published:1997-12-25

Abstract: A Monte-Carlo method on low-energy electron (LEE) scatttering in multilyer and polybasic medium is proposed. The Mott cross-section applies for discribing the elastic scattering of LEE, and the idea of mean cross section is suggested to simulate LEE elastic scattering in polybasic medium; the modified Bethe formula in polybasic medium is used for calculating energy loss of LEE inelastic scattering. The energy dissipation distributions of LEE in PMMA have been obtained.

Key words: low energy electron scattering, Monte-Carlo method, electron beam lithography, energy dissipation

CLC Number: