CHINESE JOURNAL OF COMPUTATIONAL PHYSICS ›› 2011, Vol. 28 ›› Issue (2): 306-312.

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Simulation and Fabrication of High-Voltage 4H-SiC PiN Diode with JTE

ZHANG Fasheng1,2, ZHANG Yuming2   

  1. 1. School of Computer and Information Engineering, Central South University of Forestry and Technology, Changsha 410004, China;
    2. School of Microelectronics, Xidian University, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, Xi'an 710071, China
  • Received:2010-01-21 Revised:2010-04-26 Online:2011-03-25 Published:2011-03-25

Abstract: Reverse voltage characterizations of 4H-SiC PiN diodes with junction termination extension(JTE) are simulated by using a two-dimensional device simulator(ISE-TCAD 10).0.4H-SiC PiN diodes with JTE are fabricated with a planar fabrication process based on simulation.Good consistency between simulation and experiments was achieved.It shows that a 4H-SiC PiN diode with optimized JTE edge termination can reach a breakdown voltage of 1600 V,which is more than 90 percent of ideal parallel plane junction breakdown voltage.

Key words: 4H-SiC PiN diode, JTE, simulation, process, breakdown voltage

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