Journals
  Publication Years
  Keywords
Search within results Open Search
Please wait a minute...
For Selected: Toggle Thumbnails
DEALING WITH THE PROBLEMS OF ION IMPLANTATION BY COMPUTATION PHYSICS METHOD(PART 1)——THE CALCULATION ON RANGE AND ENERGY DEPOSIT IN AMORPHOUS TARGETS
Xu Huai-qi, Wei Mao-xin
CHINESE JOURNAL OF COMPUTATIONAL PHYSICS    1986, 3 (3): 375-382.  
Abstract212)      PDF (456KB)(1078)      
A computation physics method is used here to deal with the problems of ion implantation.The Monte Carlo method is adopted as the simulated method.All complicated structure and component targets can be classified to three type of probability function formulations,Then, by direct Sampling method, ion implantation problems in those targets can be fransformed to the same problems in the simple average and single element targets,So, any type of complicated ion implantation problems can be calculated easely.A experienced formulation about how to determine the maximum impact parameter is also given here in this article.
Related Articles | Metrics