图1 (a) 周期性排列的矩形条纹掩膜示意图(黑色部分为遮光区域，白色部分为光照区。); (b) ABC三元混合物与纳米颗粒共混体系的自组装形貌图(颜色条中值小于0(蓝色区域)为B组分; 大于0(绿色区域)表示A组分; 大于1(红色和黄色区域)表示C组分。黑色代表纳米粒子。)

Fig.1 (a) Rectangular striped photomasks arranged periodically; (The black part is the mask area for shading. The white part is the light region where reaction in formula (1) takes place.) (b) Self-assembled morphology of the ternary mixture ABC and nanoparticles (Color schemes: Values < 0 (blue regions) indicate B component; Values > 0 (green regions) indicate A component; And values > 1 (red and yellow regions) indicate C component. Nanoparticles are represented by black.)

图2 改变纳米粒子与聚合物的相容性和纳米粒子的浓度所产生的典型形貌 (第1行是纳米粒子浸润C组分时的典型形貌，第2行是纳米粒子浸润AB组分时的典型形貌，第3行和第4行是纳米颗粒浸润A组分时的典型形貌。)

Fig.2 Typical morphograms generated by changing compatibility of nanoparticles with polymers and concentration of nanoparticles (The first row shows typical morphology of C-phase system formed by nanoparticle infiltration.In the second row, the infiltration of nanoparticles is neutral. Typical morphology structures are formed as AB phase is arbitrarily infiltrated. The third and fourth rows are typical morphology and structures of nanoparticle infiltration on A phase systems.)

图3 纳米粒子浓度与浸润性质关系的二维相图

Fig.3 A two-dimensional phase diagram of nanoparticle concentration and wetting property

图4 典型形貌结构中AB组份浓度差ΦA-B在y = 200方向的浓度分布

Fig.4 Concentration distributions of AB component difference ΦA-B in y = 200 direction in typical morphologies

图5 C组分在光照区域的空间平均浓度分布随时间的变化曲线

Fig.5 Average concentration distributions of C component with typical morphology in the light region

图6 改变掩膜数量和系统组分体积分数所产生的一系列典型形貌

Fig.6 A series of typical morphologies produced by changing the number of masks and the composition of the system

图7 掩膜数量和C组分体积分数关系的二维相图

Fig.7 A two-dimensional phase diagram of the system as the number of masks and the volume fraction of component C

图8 C组分在光照区域的空间平均浓度分布随时间的变化曲线

Fig.8 Average concentration distributions of C component with typical morphology in the light region

图9 光反应速率和掩膜数量关系的二维相图

Fig.9 A two-dimensional phase diagram of light reaction rates and number of masks

图10 C组分在光照区域的空间平均浓度分布随时间的变化

Fig.10 Average concentration distributions of C component with typical morphology in the light region