计算物理 ›› 2006, Vol. 23 ›› Issue (6): 738-742.

• 论文 • 上一篇    下一篇

平面行星夹具的物理气相沉积均匀性计算

方明, 范正修, 黄建兵   

  1. 中国科学院上海光学精密机械研究所薄膜中心, 上海 201800
  • 收稿日期:2005-06-17 修回日期:2006-01-16 出版日期:2006-11-25 发布日期:2006-11-25
  • 作者简介:方明(1981-),男,湖南,研究实习员,从事光学薄膜工艺方面的研究,上海嘉定清河路390号薄膜中心201800.

Numerical Simulation of a Flat Planetary Fixture for Physical Vapor Deposition

FANG Ming, FAN Zheng-xiu, HUANG Jian-bing   

  1. Resources and Department Center for Optical Coating Films, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • Received:2005-06-17 Revised:2006-01-16 Online:2006-11-25 Published:2006-11-25

摘要: 建立了平面行星夹具薄膜淀积无量纲模型,通过对蒸发源位置L/H、行星主轴与副轴距离P/H、夹角倾角A以及蒸发源蒸汽发射特性N等因素的分析,得到了典型径向理论均匀的优化几何配置.并从优化几何配置的膜料效率、角向均匀性和膜厚分布对蒸发源蒸汽发射特性变化的敏感性方面评价优化结果,得到了最优化设计区域.结果表明,优化配置的L/H+P/H小,则角分布差异小;L/H+P/HA小,则膜料效率高L<P,A=-15°时,优化配置对N变化最不敏感L>P时,由N变化引起的典型径向分布变化小于0.5%.

关键词: 薄膜淀积, 均匀性, 平面行星夹具, 计算机模拟

Abstract: A thin film deposition dimensionless model for flat planetary fixture is developed.Optimal geometric configurations with theoretical representative radial uniformity are acquired by analyzing the evaporating source location L/H,the distance between the main axis and the secondary axis P/H,the slope angle of fixture A and the emissive characteristics of vapor source N.An optimum design zone is shown by evaluating optimal geometric configurations with coating materials efficiency,angular uniformity and emissive characteristics sensitivity.The results indicate that the thickness via angular distribution is more uniform as L/H+P/H is small and the coating material efficiency is higher when both L/H+P/H and A are small;As L<P and A=-15deg,the optimal geometric configurations are more insensitive to N;As L>P,the change of the representative radial distribution due to the change of the emissive characteristics is less than 0.5%.

Key words: physical vapor deposition, uniformity, flat planetary fixture, computer simulation

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