计算物理 ›› 2012, Vol. 29 ›› Issue (2): 227-233.

• 论文 • 上一篇    下一篇

氮气射频放电与直流放电PIC/MC模拟的比较

张连珠, 赵海涛, 孙倩, 姚福保, 杨巍   

  1. 河北师范大学物理科学与信息工程学院, 石家庄 050024
  • 收稿日期:2011-06-26 修回日期:2011-10-03 出版日期:2012-03-25 发布日期:2012-03-25
  • 作者简介:张连珠(1957-),女,教授,主要从事低温等离子体数值模拟研究,E-mail:zhanglianzhu-1@163.com
  • 基金资助:
    河北省自然科学基金(A2006000123)资助项目

A Comparison of Radio-frequency and Direc Current Discharge in Nitrogen with PIC/MC Model

ZHANG Lianzhu, ZHAO Haitao, SUN Qian, YAO Fubao, YANG Wei   

  1. College of Physics Science and Information Engineering, Hebei Normal University, Shijiazhuang 050024, China
  • Received:2011-06-26 Revised:2011-10-03 Online:2012-03-25 Published:2012-03-25

摘要: 建立氮气容性射频等离子体过程的PIC/MC模型,将模拟结果与直流放电进行比较.结果表明:射频等离子体粒子(e,N2+,N+)的平均密度较直流放电约大-个量级,在射频电极附近粒子(e,N2+,N+)的平均能量比直流放电阴极附近的能量低3倍左右;密度偏低的原子离子N+在两电极附近具较高的能量,能量较低的分子离子N2+在放电空间具较高密度,N2+的密度大约是N+的6倍;计算的电子能量几率分布与测量结果-致.

关键词: 氮气射频放电, PIC/MC模拟, N2等离子体

Abstract: A PIC/MC model is developed for electrons,atomic ions N+ and molecular ions N2+ in a capacitively coupled rf glow discharge.Modeling results are compared with those in a dc glow discharge at similar conditions.It reveals that the mean densities of particles(e,N2+,N+) in rf discharge are nearly ten times greater than those in dc discharge,the mean energy near a rf electrode is about three times less than that near a cathode in dc discharge;the ions N+ have higher energy near two electrodes,the ions N2+ have higher density,and the density of N2+ is about six times the density of N+.The simulated electron energy probability distributions agree with measured results.

Key words: nitrogen rf discharge, particle-in-cell-Monte Carlo method, nitrogen plasma

中图分类号: