关键词: 动态靶, Monte Carlo模拟, 择优溅射, 溅射产额

Abstract: A Monte Carlo computer program simulating the sputtering of two-component multi-layer dynamic target is presented, including principle, physical models, program design and applicability. The atomic scattering is governed by the Moliere approximation to the Thomas-Fermi potential and is evaluated with the binary-collision approximation. The target is treated in slab geometry, and the thickencss and the target composition of each slab can be rearranged during sputtering.This program can be used to calculate sputtering yields of two-component amorphous target and, therefore, to study preferential sputtering, energy and angular distributions of sputtered species as well as the depth of origin of the sputtered particles in solid target. Some calculation results are given in this paper.

Key words: dynamic target, Monte Carlo simulation, preferential sputtering, sputtering yield