CHINESE JOURNAL OF COMPUTATIONAL PHYSICS ›› 1996, Vol. 13 ›› Issue (2): 136-140.

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THEORETICAL STUDIES ON THE VALENCE-BAND OFFSETS AT Si/Ge HETEROJUNCTIONS

Wang Renzhi, Zheng Yongmei, Kea Snhuang, Huang Meiehun, Zhu Zizhong   

  1. Department of Physics, Xiamen Univesity, 361005
  • Received:1994-10-11 Revised:1995-09-19 Online:1996-06-25 Published:1996-06-25

Abstract: Based on an ab initio pseudopotentials band structure method,a theoretical approach of tak-ing the average-band energy as a energy reference is suggested to determine the valence-band offsets at Si/Ge heterojunctions under three different strain conditions:using Si as a substrate,using Ge as a substrate and Si-layer,Ge-layer deforming freely.The results are 0.731eV,0.243eV and 0.521eV respectively,in good agreement with relevant experimental values.

Key words: Ge/Si heterojunction, Valence-band offsets, Theoretical calculation

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