CHINESE JOURNAL OF COMPUTATIONAL PHYSICS ›› 2013, Vol. 30 ›› Issue (3): 396-402.

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Numerical simulation of Titanium Cathode Sputtering in Nitrogen Microhollow Cathode Discharge

GAO Shuxia, ZHANG Su, MENG Xiulan, ZHANG Lianzhu   

  1. College of Physics Science and Information Engineering, Hebei Normal University, Shijiazhuang 050024, China
  • Received:2012-08-27 Revised:2012-12-28 Online:2013-05-25 Published:2013-05-25

Abstract: We analyze numerically thermalization process of atoms sputtered from a cathode in N2/Ti micro-hollow cathode discharge plasma by using Monte Carlo method.PIC/MC model is used to simulate nitrogen ion(N2+,N+) bombarding cathode surface.Thermalization process,density distribution and average energy of Ti atoms are calculated.It shows that initial energy sputtered to all directions from 90 percent of Ti metal atoms is less than 30 eV.Its scattering angle is mainly between 30 and 60 degrees.And thermalization maximum of sputtering Ti atoms is appeared at a distance of about 0.04mm from the hollow cathode wall.

Key words: microhollow cathode discharge, sputtering of the cathode, nitrogen plasma, monte-carlo model

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