CHINESE JOURNAL OF COMPUTATIONAL PHYSICS ›› 2003, Vol. 20 ›› Issue (1): 21-24.

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Simulation of Electron Beam Tracing in the X-ray Source with Microbeam

WANG Kai-ge1, NIU Han-ben1, ZHOU Yan2   

  1. 1. Xi'an Institute of Optics & Precision Mechanics, Academia Sinica, Xi'an 710068, China;
    2. Department of Photoelectronics Engineering, Beijing Institute of Technology, Beijing 100081, China
  • Received:2001-04-24 Revised:2001-11-04 Online:2003-01-25 Published:2003-01-25

Abstract: The focal dimension of the X-ray source with microbeam is in proportion to the size of the e-beam focused on the target surface. The finite difference method is utilized to calculate the distribution of the electrical-field intensity. The track of the electron-beam is traced by using the Runge-Kutta method within the whole symmetrical system. As a result, the diameter of the electron beam focus is 0.6-1.0μm while the total high brightness emission of the LaB6 crystal cathode is 0.06-0.3mA.

Key words: finite difference method, optimal coefficient, X-ray source with microbeam, Runge-Kutta method

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