Fig.1 (a) Rectangular striped photomasks arranged periodically; (The black part is the mask area for shading. The white part is the light region where reaction in formula (1) takes place.) (b) Self-assembled morphology of the ternary mixture ABC and nanoparticles (Color schemes: Values < 0 (blue regions) indicate B component; Values > 0 (green regions) indicate A component; And values > 1 (red and yellow regions) indicate C component. Nanoparticles are represented by black.)

Fig.2 Typical morphograms generated by changing compatibility of nanoparticles with polymers and concentration of nanoparticles (The first row shows typical morphology of C-phase system formed by nanoparticle infiltration.In the second row, the infiltration of nanoparticles is neutral. Typical morphology structures are formed as AB phase is arbitrarily infiltrated. The third and fourth rows are typical morphology and structures of nanoparticle infiltration on A phase systems.)

Fig.3 A two-dimensional phase diagram of nanoparticle concentration and wetting property

Fig.4 Concentration distributions of AB component difference ΦA-B in y = 200 direction in typical morphologies

Fig.5 Average concentration distributions of C component with typical morphology in the light region

Fig.6 A series of typical morphologies produced by changing the number of masks and the composition of the system

Fig.7 A two-dimensional phase diagram of the system as the number of masks and the volume fraction of component C

Fig.8 Average concentration distributions of C component with typical morphology in the light region

Fig.9 A two-dimensional phase diagram of light reaction rates and number of masks

Fig.10 Average concentration distributions of C component with typical morphology in the light region