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INFLUENCE OF SURFACE TRENCH ON UNIFORMITY OF PLASMA IMMERSION ION IMPLANTATION
ZENG Zhao-ming, TANG Bao-yin, WANG Song-yan, TIAN Xiu-bo, LIU Ai-guo, WANG Xiao-feng, CHU Paul K
CHINESE JOURNAL OF COMPUTATIONAL PHYSICS
2000, 17 (4):
449-454.
The sheath expansion around a planar target with an arc trench during plasma immersion ion implantation(PⅢ) is simulated numerically with a two-dimensional fluid model.The sheath potential,ion velocity and ion density during sheath expanding are calculated.The distribution of ion incident angle and dose along the target surface is presented.It provides the theoretical base for treatment of the targets with complicated shape using plasma immersion ion implantation.
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