一维原子刻蚀的数值模拟

计算物理 ›› 2004, Vol. 21 ›› Issue (3): 327-332.

一维原子刻蚀的数值模拟

何明, 李若虹, 王晓锐, 王谨, 詹明生

中科院武汉物理与数学研究所, 波谱与原子分子国家重点实验室, 湖北武汉 430071

收稿日期:2002-12-26 修回日期:2003-09-23 出版日期:2004-05-25 发布日期:2004-05-25
作者简介:何明(1975-),male,hengyang,hunan,PHD student,studying theory and experiment of cold atom physics and quantum optics.

Numerical Simulation of One-dimensional Atom Lithography

HE Ming, LI Ruo-hong, WANG Xiao-rui, WANG Jin, ZHAN Ming-sheng

Laboratory of Magnetic Resonance and Atomic and Molecular Physics, Wuhan Institute of Physics and Mathematics, Chinese Academy of Sciences, Wuhan 430071, China

Received:2002-12-26 Revised:2003-09-23 Online:2004-05-25 Published:2004-05-25

摘要/Abstract

摘要： 通过直接的数值模拟,分析了原子束在激光驻波场下传播的动力学行为.估计了Cr原子沉积在基片上的焦点的大小,同时还发现一些实验参数会影响原子刻蚀的精度:如原子束的速度分布、激光的失谐量和激光束的直径等.

关键词: 原子刻蚀, 激光驻波场, 量子力学数值模拟

Abstract: Building on direct numerical calculation, it analyzes the dynamics of atoms propagating through a laser standing wave (SW) potential in the regime of immersion-lens.The spot size of Cr atomic deposition is estimated. It is also shown that some physical quantities, such as atomic velocity distribution, laser detuning and laser beam radius, play important roles in determining the quality of atom lithography.

Key words: atom-lithography, standing wave, quantum-mechanical numerical simulation

中图分类号:

O562.2

何明, 李若虹, 王晓锐, 王谨, 詹明生. 一维原子刻蚀的数值模拟[J]. 计算物理, 2004, 21(3): 327-332.

HE Ming, LI Ruo-hong, WANG Xiao-rui, WANG Jin, ZHAN Ming-sheng. Numerical Simulation of One-dimensional Atom Lithography[J]. CHINESE JOURNAL OF COMPUTATIONAL PHYSICS, 2004, 21(3): 327-332.