计算物理 ›› 2001, Vol. 18 ›› Issue (3): 230-234.

• 论文 • 上一篇    下一篇

基于机群系统的薄膜淀积并行计算

舒继武1, 郑纬民1, 沈美明1, 黄汉臣2   

  1. 1. 清华大学计算机科学与技术系, 北京 100084;
    2. 香港理工大学机械工程系, 香港
  • 收稿日期:1999-11-19 修回日期:2000-06-14 出版日期:2001-05-25 发布日期:2001-05-25
  • 作者简介:舒继武(1968-),男,湖北,博士后,从事并行处理技术及分布式计算方面的研究.
  • 基金资助:
    国家自然科学基金(No.69933020)和国家重点基础研究发展规划项目(No.G1999032702)资助项目

PARALLEL COMPUTATION FOR THE THIN FILM DEPOSITION ON THE NOW

SHU Ji-wu1, ZHENG Wei-min1, SHEN Mei-ming1, HUANG Han-chen2   

  1. 1. Department of Computer Science and Technology, Tsinghua University, Beijing 100084, P R China;
    2. Department of Mechanical Engineering, The HongKong Polytechnic University, HongKong
  • Received:1999-11-19 Revised:2000-06-14 Online:2001-05-25 Published:2001-05-25

摘要: 基于集群并行系统,实现了运用蒙特卡罗方法模拟100×100×100个原子Si衬底Al薄膜淀积过程的并行计算.采用了重叠的区域分解法和异步通信的有效并行计算策略,将区域的合理划分与薄膜淀积的空间填补的拓扑几何机理结合起来,着重减少通信耗费,提高算法的并行性能,大量地缩短了薄膜淀积模拟计算时间,从而为运用计算机方法模拟薄膜淀积、完成薄膜材料淀积的预测提供了更高效的手段.

关键词: 薄膜淀积, 并行模拟, 蒙特卡罗方法, 区域分解

Abstract: An approach to the parallelization is proposed on the network of workstation,that simulates the produce of the thin film deposition with a scale of 100×100×100 atomic sites in three-dimension by Monte Carlo method.It uses a efficient parallel algorithm for the thin film deposition simulation using domain decomposition and asynchronous parallel communication,and adopts the reasonable division of domain with the topology geometric of space filling in the film deposition process.The results show that parallel processing generated by these methods can make communication overhead fallen off considerably,and the parallel performance of algorithm improved and computation time for the thin film deposition decreased largely.

Key words: the thin film deposition, parallel computing, Monte Carlo method, domain decomposition

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