Phase Field Crystal Method Study on Inhibitory Mechanism of the Growth of Kirkendall Voids During Deformation Process at the Interface of Metal Micro Interconnect Structures

doi:10.19596/j.cnki.1001-246x.8618

Abstract

Abstract:

In this paper, the phase field crystal method is employed to simulate and study the inhibition effect of the growth of Kirkendall voids at the interface of metal micro interconnection structures during the deformation process. The effect of bidirectional constant rate of strain on the microstructure evolution and growth kinetics of Kirkendall voids with different orientation differences at the symmetric interface of metal micro interconnects is mainly studied. The research results show that the interface of the metal micro interconnect structure has a tendency of amorphization under the action of bidirectional constant rate of strain, and the atomic mismatch and defect density of the interface increase, thereby inhibiting the growth of Kirkendall voids. The bidirectional constant rate of strain does not change the nucleation mode of Kirkendall voids in the case of symmetric interface orientation, and the nucleation modes of Kirkendall voids are all grain boundary nucleation after the system nucleation point is saturated. The Kirkendall voids are uniformly distributed at the small-angle symmetrical and large-angle symmetrical interfaces of the metal micro interconnect structure. The average size and area of Kirkendall voids increase with evolution time. The average size, area and growth index of Kirkendall voids gradually decrease with the increase of the misorientation of the small-angle symmetric interface. The average size and area of Kirkendall voids gradually decrease with the increase of the misorientation of the large-angle symmetric interface, while the growth index increases. The bidirectional constant rate of strain can effectively reduce the growth size and area of Kirkendall voids, inhibit the growth of Kirkendall voids, and improve the reliability of metal micro interconnect structures.

Key words: Kirkendall voids, micro-scale metal interconnect, inhibitory mechanism, phase field crystal method, growth kinetics, deformation

Wenjing MA, Jin WANG, Hui GUO, Meini LYU, Hongze ZHANG, Dongde LI. Phase Field Crystal Method Study on Inhibitory Mechanism of the Growth of Kirkendall Voids During Deformation Process at the Interface of Metal Micro Interconnect Structures[J]. Chinese Journal of Computational Physics, 2023, 40(4): 416-424.

Figures/Tables 10

Fig.1 Initial simulation area

Fig.2 Grain boundary microstructure observed by HRTEM[21]

Fig.3 Schematic diagram of symmetry interface misorientations (a) symmetry interface; (b) interface orientation angle

Fig.4 Isovolumetric deformation

Fig.5 Microstructure and morphology of Kirkendall voids (a)~(c) θ=4.8°; (d)~(f) θ=8.2°; (g)~(i) θ=9.4°; (a), (d), (g) t=1.0×105; (b), (e), (h) t=3.6×105; (c), (f), (i) t=8.6×105

Fig.6 Growth behavior of Kirkendall voids vs time (a) average size of Kirkendall voids vs time; (b) area of Kirkendall voids vs time

Table 1 The growth exponent of Kirkendall voids

	Y=K_tt^n_y
	K_t	n_y
4.8°	2.522 77	0.128 3
8.2°	2.894 74	0.126 57
9.4°	2.341 47	0.112 9

Fig.7 Microstructure and morphology of Kirkendall voids (a)~(c) θ=16.6°; (d)~(f) θ=18.4°; (g)~(i) θ=22.8°; (a), (d), (g) t=1.0×105; (b), (e), (h) t=3.6×105; (c), (f), (i) t=8.6×105

Fig.8 Growth behavior of Kirkendall voids vs time (a) average size of Kirkendall voids vs time; (b) area of Kirkendall voids vs time

Table 2 The growth exponent of Kirkendall voids

	Y=K_tt^n_y
	K_t	n_y
16.6°	3.735 38	0.072 16
18.4°	3.347 04	0.087 37
22.8°	2.978 63	0.106 37

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