关键词: 载能沉积, 分子动力学模拟, 吸附原子, 溅射产额, 空位产额

Abstract: Molecular dynamics simulation with embedded atom method is used to study energetic deposition on Pt(111)surface with Ni atoms at incident angles(θ)in a range of 0°to 80°(normal to the surface).Dependence of sputtering yields.adatom yields and vacancy yields on θ can be divided into throe different regions,θ≤20°,20°< θ < 60°,and θ≥60°respectively.As θ is smaller than 20°energetic deposition is similar to that at θ=0°.While 20° < θ < 60°,depth of projectile implantation decreases with incident angle.Distribution of adatoms is uniform,which contribute to uniformity of nucleation and layer-by.1ayer growth of film.As θ≥60°. energetic deposition has no obvious effect ou surface of Pt(111)substrate.

Key words: energetic deposition, molecular dynamics simulation, adatom, sputtering yields, vacancy yields